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STE RIE, STE ICPe, STE ICPd series

STE ICPe68/STE ICPe68L

STE ICPe68/STE ICPe68L is automated station for plasmachemical etching in combined plasma regimes

– ICP and RIE.

 

STE ICPd81/STE ICPd81L

STE ICPd81/STE ICPd81L system is automated station for carrying out plasma enhanced chemical vapor deposition (SiNx, SiO2 etc.).

STE RIE84

STE RIE84 is a simplified version of the etching System for semiconductor or dielectric layers processing in capacitive discharge plasma.

SemiTEq JSC
27 Engels avenue, Saint-Petersburg,
Russia, 194156

tel: +7 (812) 633-05-96 +7 (812) 702-13-08
fax: +7 (812) 633-05-97 +7 (812) 320-43-94
E-mail: sales@semiteq.ru